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NIST Special Publication 260-174, 2011 Ed. User's Guide for SRM 2494 and 2495
NIST Special Publication 260-174, 2011 Ed. User's Guide for SRM 2494 and 2495
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The Microelectromechanical System (MEMS)5 5-in-1 is a standard reference device sold as a NIST Standard Reference Material (SRM) in the form of a test chip that contains test structures for five standard test methods. The five standard test methods are for Young's modulus, residual strain, strain gradient, step height, and in-plane length measurements as documented in the Semiconductor Equipment and Materials International (SEMI) standard test method MS4, the American Society for Testing and Ma…

NIST Special Publication 260-174, 2011 Ed. User's Guide for SRM 2494 and 2495 (el. knyga) (skaityta knyga) | knygos.lt

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The Microelectromechanical System (MEMS)5 5-in-1 is a standard reference device sold as a NIST Standard Reference Material (SRM) in the form of a test chip that contains test structures for five standard test methods. The five standard test methods are for Young's modulus, residual strain, strain gradient, step height, and in-plane length measurements as documented in the Semiconductor Equipment and Materials International (SEMI) standard test method MS4, the American Society for Testing and Materials International (ASTM) standard test method E 2245, ASTM standard test method E 2246, SEMI standard test method MS2, and ASTM standard test method E 2244, respectively. SEMI standard test method MS4 also contains equations for the residual stress and stress gradient and SEMI standard test method MS2 can be used to obtain thickness measurements using the electro-physical technique for SRM 2494 and the opto-mechanical technique for SRM 2495.

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The Microelectromechanical System (MEMS)5 5-in-1 is a standard reference device sold as a NIST Standard Reference Material (SRM) in the form of a test chip that contains test structures for five standard test methods. The five standard test methods are for Young's modulus, residual strain, strain gradient, step height, and in-plane length measurements as documented in the Semiconductor Equipment and Materials International (SEMI) standard test method MS4, the American Society for Testing and Materials International (ASTM) standard test method E 2245, ASTM standard test method E 2246, SEMI standard test method MS2, and ASTM standard test method E 2244, respectively. SEMI standard test method MS4 also contains equations for the residual stress and stress gradient and SEMI standard test method MS2 can be used to obtain thickness measurements using the electro-physical technique for SRM 2494 and the opto-mechanical technique for SRM 2495.

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