422,19 €
Silicon Molecular Beam Epitaxy
Silicon Molecular Beam Epitaxy
  • Išparduota
Silicon Molecular Beam Epitaxy
Silicon Molecular Beam Epitaxy
El. knyga:
422,19 €
This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroep…
  • Leidėjas:
  • Metai: 2018
  • Puslapiai: 306
  • ISBN: 9781351093521
  • ISBN-10: 1351093525
  • ISBN-13: 9781351093521
  • Formatas: ACSM ?
  • Kalba: Anglų

Silicon Molecular Beam Epitaxy (el. knyga) (skaityta knyga) | knygos.lt

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422,19 € El. knyga

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This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.

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  • Autorius: E. Kasper
  • Leidėjas:
  • Metai: 2018
  • Puslapiai: 306
  • ISBN: 9781351093521
  • ISBN-10: 1351093525
  • ISBN-13: 9781351093521
  • Formatas: ACSM ?
  • Kalba: Anglų

This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.

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